EUV Lithography Market Global Industry Perspective, Comprehensive Analysis and Forecast, 2021 20
Extreme ultraviolet is a next-generation lithography technology using a range of extreme ultraviolet (EUV) wavelengths, roughly spanning a 2% FWHM bandwidth about 13.5 nm. The majorly rising global demand for smartphones is will drive the market for EUV lithography over the forecast period.
Extreme ultraviolet lithography (EUVL) is an advanced technology for making microprocessors a hundred times more powerful than traditional ones. EUVL is like optical lithography in which light is refracted through camera lenses onto the wafer.
Global EUV Lithography market is primarily driver by trend of miniaturization. Lithography is used to print complex patterns that define integrated circuits onto semiconductor wafers. EUV lithography (EUVL) is one of the leading next generation lithography (NGL) technologies. Using EUVL, it is easy to get compact electronic chips with less power requirements. The technology features enhanced resolving power and is cost-effective.
Together these structures form an integrated circuit known as a chip. The unrelenting drive of the semiconductor industry for ever more powerful microchips means that chipmakers must pack even more structures onto a chip, thereby making the chip faster and more powerful while simultaneously lowering the production costs.
With this finer resolution, chipmakers are now capable of producing smaller, faster and more powerful chips, while the complexity of the manufacturing process and the costs stay within the framework.
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The global EUV Lithography market is segmented into Laser produced plasma (LPP), vacuum sparks, and gas discharges. In 2018, LPP segment accounted for the majority share in the market. Laser-produced plasmas are plasmas produced by firing high-intensity beams of light. Laser-produced plasmas have been used to create short bursts of x-rays and to accelerate particles — so-called plasma-based accelerators. Laser produced plasmas are also useful for recreating astrophysical plasmas in the laboratory.
The global EUV Lithography Market is segmented into North America, Asia-Pacific (APAC), Europe, South America, and the Middle East and Africa (MEA).
In 2018, APAC accounted for the majority share in the global EUV Lithography Market owing to the presence of a major players and growing demand for consumer electronics such as smartphones, tablets and rising demand for automobiles from countries like China, Japan, South Korea, and India.
According to SEMI, the worldwide semiconductor manufacturing and inspection equipment billings reached USD 16.7 billion in the second quarter of 2018 out of which USD 13.2 billion market share of semiconductor inspection and manufacturing equipment was occupied by the Asian countries like Korea, China, Taiwan, and Japan accounting for a whopping 80% global share.
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Global EUV Lithography Market is a concentrated market with the major share held by key players in the market. The market is quite competitive and to gain competitive advantage, the major EUV Lithography manufacturers adopt several strategies such as M&A, joint ventures, contracts, and agreements to help them sustain the market’s competitive environment.
The major players include ASML, Canon Inc., Intel Corporation, Nikon Corporation, NuFlare Technology Inc., Samsung Corporation, SUSS Microtec AG, Taiwan emiconductor Manufacturing Company Limited (TSMC), Ultratech Inc., Vistec Semiconductor Systems, and among others.
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